The ALD/ALE2024 conference is showcasing the PillarHall Lateral High Aspect Ratio (LHAR) test structure in numerous pivotal presentations this year. This trend underscores the importance and versatility of PillarHall structure in pushing the boundaries of conformality research and ALD technology.
Key Presentations Featuring PillarHall Structures
Unveiling ALD Reaction Mechanisms
Dr. Jussi Kinnunen will discuss the influence of precursor pressure on secondary growth fronts in ALD processes. His presentation, titled “PillarHall Lateral High Aspect Ratio Assisted Unveiling of Secondary Growth Front and Background Reaction Mechanism in Atomic Layer Deposition,” highlights the sophistication of 3D ALD structural analysis. The talk is scheduled for August 7th at 9:00 AM in Room Hall 3A.
ALD Film Conformality in Manufacturing
Thomas Werner will present “Accurate and Fast Wafer Level Conformality Analysis Method for ALD Films,” addressing the impact of precursor inlet and outlet dynamics on film thickness and penetration in ALD processes. This presentation is part of the ALD for Manufacturing Poster session on August 5th, from 5:45 to 7:00 PM in Room Hall 3.
Advanced Surface Characterization Techniques
Dr. Jennifer S. Emara from the Fraunhofer Institute, focuses on “ALD Deposited Lanthanum Doped HfO2 Thin Films on LHAR Structures,” and utilizes techniques like X-ray Photoelectron Spectroscopy (XPS) and Time-of-Flight Secondary Ion Mass Spectrometry (ToF-SIMS). This poster presentation will be presented by one of the co-authors Sascha Bönhardt from behalf of Dr. Emara. This session will take place during the ALD Fundamentals Poster on August 5th from 5:45 to 7:00 PM in Room Hall 3.
Analyzing ALD Saturation Profiles
Prof. Riikka L. Puurunen from Aalto University will explore the kinetics of ALD processes in her presentation titled “Impact of the Knudsen Number on the ALD Saturation Profile Characteristics” at the same session and venue on August 5th. Her work uses the extended slope method to deepen understanding of ALD behaviour under varying conditions.
Ternary Oxides by Spatial ALD
On August 7th, Mike van de Poll from Eindhoven University of Technology will share his findings on “Conformality of Ternary Oxides” during the Growth and Characterization session at 8:00 AM in Room Hall 3A. His combination of Monte Carlo Simulations and experimental studies offers new insights into spatial ALD processes.
Low-Temperature ALD-MLD Processes
On August 6th, Dr.Anish Philip will present a poster on “Atomic-Molecular Layer Deposition of Zn-Benzenedithiol Thin Films” during the Emerging Materials Poster session from 5:45 to 7:00 PM in Room Hall 3. His research into low-temperature, air-stable, and conformal coatings using PillarHall test structures opens new avenues for ALD-MLD process applications.
Exploring Hafnium Oxide Processes
Stijn van der Heijden from Eindhoven University of Technology will discuss the conformality of hafnium oxide in combination with ZrO2 processes in his presentation, which could significantly impact the development of ferroelectric devices. His session is scheduled for August 5th during the ALD Fundamentals Poster.
Additional Noteworthy Presentations
Further contributions include “Conformality Characterization of Al-Doped ZnO Films Grown by Atomic Layer Deposition on Lateral High-Aspect-Ratio Test Structures” by Eero Haimi from Aalto university on Mon, Aug 5th from 5.45 to 7:00 pm in Room Hall 3 AF-MoP: ALD Fundamentals Poster Session,
and “Thin Film Conformality Evaluation on a Wafer Level in Thermal ALD Reactor using LHAR Test Structures” by Oili Ylivaara from VTT. on Mon, Aug 5th from 5.45 to 7:00 pm in Room Hall 3 AM-MoP: ALD for Manufacturing Poster Session,
Through these diverse and insightful presentations, the ALD/ALE2024 conference not only reinforces the significance of PillarHall LHAR structure in advancing ALD technology but also serves as a testament to the ongoing innovation and research in the field.
